Stimulated Raman scattering (SRS) captures and amplifies light, a process that can be further enhanced by exploiting silicon photonics. This technology describes a silicon photonic crystal with a lattice of air holes that is configured to receive pump light and to output Stokes light through Raman scattering. Lithographically patterned line defects form a waveguide to facilitate Raman lasing in specially dimensioned lattices, allowing wavelength manipulation beyond material norms. Additionally, using silicon-based materials enables low-cost integration of photonics into complementary metal oxide semiconductor (CMOS) chips, as well as new lasing techniques for high speed optical switching.
This technology is the first SRS photon generating method that can successfully be integrated into a CMOS chip and used as a single wavelength lasing source. By tuning the periodicity and size of the holes in the silicon crystal, the wavelength of the SRS photons generated can be finely tuned. In addition to functioning as laser sources, the waveguides can be integrated with CMOS to form fast and effective optically switchable logic gates. This enables photonic and electronic integrated circuits to be used in photo-regulated signal processing or computing without the need for additional mechanical parts.
The tunability of the band gap of the waveguides was verified via transmission spectroscopy, while the laser emission was determined through simulations of the pump and emitted electric field.
Patent Issued (US 7,869,470)
Patent Issued (US 8,287,642)
Patent Pending (WO/2007/027982)
Tech Ventures Reference: IR M05-098