This technology is a method for selectively sealing nanoscale defects in submicron-thick ion-conducting membranes, thereby reducing hydrogen crossover while preserving proton conductivity.
Ultrathin proton-conducting oxide membranes offer high efficiency and low resistance for fuel cells and electrolyzers; however, their performance is limited by unavoidable pinholes and microcracks that form during fabrication and operation. These defects cause hydrogen leakage, safety risks, and reduced operational efficiency. Existing approaches do not provide a scalable, post-fabrication method to effectively mitigate defects without impairing ionic transport. A reliable defect remediation strategy is necessary to ensure the safe and high-performance operation of ultrathin membranes in commercial systems.
This method selectively plugs nanoscale defects in submicron-thick proton-conducting membranes using an electrochemically-assisted deposition process. Pinholes and microcracks are locally sealed with nanoscale plugs, reducing hydrogen leakage by 5-6 orders of magnitude while leaving intact membrane regions largely unchanged, thereby preserving proton transport and membrane conductivity. This technology enables the use of ultrathin (perfluorosulfonic acid) PFSA-free membranes with improved safety and efficiency, supporting cost-effective, high-performance electrochemical systems for clean hydrogen production.
Patent Pending
IR CU25218
Licensing Contact: Dovina Qu
