This technology utilizes a microfluidics channel to deliver a series of photocurable materials to a chamber where photopolymerization under high spatial control is performed with or without the use of masks.
Current photolithographic methods for microfabrication for MEMS application typically require the often-expensive design and manufacture of customized masks, as well as the extensive time and manual labor associated with using them effectively. These existing constraints limit the efficiency for fabrications of increasingly complex microstructures with numerous distinct materials.
This technology combines microfluidic channels with photolithography for the rapid patterning of complex, composite microstructures. It utilizes a microfluidics channel to deliver a series of photocurable materials to a chamber where photopolymerization under high spatial control is performed with or without the use of masks. The microchannel allows for the rapid delivery of a low volume of reagent to wash away all unpolymerized pre-polymer prior to the subsequent material cycle, without moving fabrication setup, which necessitates realignment. Fabricated microstructures adhere to the bottom of the microchannel and extend to the full height of the microchannel chamber (hundreds of μm). Fabricated microstructures are spatially aligned and are suitable for microfluidic manipulation and analysis (e.g., material properties). This reduces fabrication time from hours to minutes and scales linearly with additional materials.
This technology has demonstrated the fabrication of composite three-dimensional microstructures with various geometries, size scales (up to 1 mm2), spatial resolution (down to 3 μm), and materials (up to 24 demonstrated).
IR 2158
Licensing Contact: Beth Kauderer