Synthesis method for high purity graphene
This technology is a chemical vapor deposition method for synthesizing ultra-high purity graphene with high mechanical strength and electrical performance.
Unmet Need: Controllable and scalable synthesis of high purity graphene
Chemical vapor deposition (CVD) is a common technique for synthesizing graphene. Current CVD methods are not well-controlled, resulting in contamination during the synthesis process and suboptimal electrical performance of the resultant graphene. Improved CVD methods are necessary to enable large-scale synthesis of graphene with attractive electrical, optical, and magnetic properties.
The Technology: CVD method for controlled synthesis of ultra-high purity graphene
This technology is a chemical vapor deposition method for synthesizing high purity graphene in a controlled manner. Atmospheric contamination is minimized through improvements to critical hardware connections, and potential user error is avoided through automated controls. This system provides a faster and lower temperature synthesis method for generating graphene with higher purity and potentially improved electrical performance.
Applications:
- Industrial manufacturing method for graphene films
- Research tool for studying graphene growth and nucleation
- Model for synthesizing heterostructure devices
- Solar cell fabrication
Advantages:
- Improved graphene purity
- Faster and lower temperature synthesis
- Automated controls
- Reproducible technique
Lead Inventor:
Related Publications:
Tech Ventures Reference:
IR CU21336
Licensing Contact: Dovina Qu