Synthesis method for high purity graphene

This technology is a chemical vapor deposition method for synthesizing ultra-high purity graphene with high mechanical strength and electrical performance.

Unmet Need: Controllable and scalable synthesis of high purity graphene

Chemical vapor deposition (CVD) is a common technique for synthesizing graphene. Current CVD methods are not well-controlled, resulting in contamination during the synthesis process and suboptimal electrical performance of the resultant graphene. Improved CVD methods are necessary to enable large-scale synthesis of graphene with attractive electrical, optical, and magnetic properties.

The Technology: CVD method for controlled synthesis of ultra-high purity graphene

This technology is a chemical vapor deposition method for synthesizing high purity graphene in a controlled manner. Atmospheric contamination is minimized through improvements to critical hardware connections, and potential user error is avoided through automated controls. This system provides a faster and lower temperature synthesis method for generating graphene with higher purity and potentially improved electrical performance.

Applications:

  • Industrial manufacturing method for graphene films
  • Research tool for studying graphene growth and nucleation
  • Model for synthesizing heterostructure devices
  • Solar cell fabrication

Advantages:

  • Improved graphene purity
  • Faster and lower temperature synthesis
  • Automated controls
  • Reproducible technique

Lead Inventor:

James Hone, Ph.D.

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