Columbia Technology Ventures

Balanced asymmetric interferometry for accurate nanophotonic measurements

This technology encompasses adjustments to the conventional asymmetric Michelson interferometer and optical scanning probe to provide accurate sub-micrometer measurements in noisy sampling environments.

Unmet Need: Accurate method for measuring nano-samples with sub-micrometer resolution

To support the rapidly growing field of nanotechnology, an increasingly popular method employs optical scanning probe microscopes with an asymmetric Michelson interferometer to measure samples with sub-micrometer resolution. Interferometers use beam splitters, mirrors, and detectors to superimpose light and achieve highly sensitive amplitude and phase readouts. However, this methodology is prone to high noise feedback in environmentally-controlled settings, such as cryogenic temperatures or vacuum.

The Technology: Coupled asymmetric interferometer with optical scanning probe for nanophotonic detection

This technology overcomes limitations in traditional optical probe scanning microscopy to enable high-resolution measurements in noisy environments. By integrating the arms of the optical interferometer into the scanning probe, this technology bypasses the primary noise source in currently employed systems. This technology compensates for tradeoffs in this innovative design by using a retroreflector and scanning probe optics that focus directly onto the sample. These improvements are particularly relevant to cryogenic or vacuum conditions that are common in 2D materials research.

This technology has demonstrated an order of magnitude noise reduction during measurements in a laboratory setting.

Applications:

  • Nanoscale microscopy and material characterization
  • Measuring optical, electrical, or magnetic properties of 2D, 1D and 0D materials
  • Correlating nanoscale topography to optical, electrical, or magnetic properties
  • Nanoscale surface enhanced Raman scattering (SERS)
  • Semiconductor device characterization
  • Scanning probe photolithography with nanoscale resolution
  • Scanning probe laser ablation with nanoscale resolution
  • Single molecule imaging
  • Optoelectronic device characterization
  • Surface plasmon polariton excitation and monitoring

Advantages:

  • Low noise – amenable to cryogenic or vacuum conditions
  • Achieves accurate micrometer-resolution of nano-samples
  • Easily tunable for sample-specific measurements
  • Capable of extracting many material properties
  • Can accommodate specialized probes as needed for user’s application

Lead Inventor:

Dimitri Basov, Ph.D.

Patent Information:

Patent Pending

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