This technology is a solution-based processing method for constructing superatomic thin-films, which facilitates their integration into electronic and thermoelectric devices.
Superatomic thin-films possess remarkable physical qualities that render them as attractive functional materials for electronic and thermoelectric devices. However, current methods of building designer atomic solids typically yield powder-based materials, which precludes their easy integration into functional devices and systems. In view of this, solution-based methods capable of producing atomically precise thin-films are needed to facilitate their physical incorporation into useful devices.
This technology is a solution-based processing method for constructing superatomic thin-films using nanoscale, atomically precise clusters. The clusters contain long and flexible side-chains, which restrict molecular electrostatic attractions and prevent powder formation, such that the materials can be suspended in solution without sacrificing performance. These clusters form amorphous and homogenous thin-films with extremely high electrical conductivity, ultra-low thermal conductivity and high optical transparency. As such, this technology provides a route towards easy integration of atomic thin-films into functional devices and coatings.
IR CU19396
Licensing Contact: Greg Maskel