This technology is a lithographic technique to pattern surfaces with microscale pillars of varying rigidity to monitor cellular responses to various culture surfaces.
Physical factors in the environment of a cell are involved in regulating various responses, such as growth and differentiation. Currently, many experiments aimed at exploring these responses involve plating cells on elastomeric surfaces patterned into microscale pillars. However, as cell responses vary by surface rigidity, having a limited range of surface rigidity can severely limit the cellular functions able to be investigated.
This technology modulates the rigidity of elastomeric microscale pillars by exposure to an energetic electron beam. By varying the length of the electron beam exposure time, the technology is able to control biocompatible polymer cross-linking, thereby providing different degrees of microscale pillar rigidity. Moreover, the surface can be irradiated over areas as large as hundreds of micrometers or as small as 10 nanometers, giving tremendous range and versatility in the surface conditions being studied. This technology, therefore, offers control over the extracellular environment of cells to control their behavior and phenotype in an effective, non-invasive manner.
IR M08-073
Licensing Contact: Beth Kauderer